Centrifuge 5920 R is a large bench top refrigerated centrifuge with exceptional performance and high capacity, making it a superior choice for high-throughput applications. It can handle common lab scale-tube formats, but in our lab it is mainly used for scale-up production where up to 4 x 1000...

Evaporation system is formed for two independent UHV chambers with a base pressure of 10-10 mbar. One of them is equipped with an e-beam evaporation source, which allows the deposition of metals and metal in substrates up to 51 cm diameter. The second chamber is for molecular materials...

The QE-R system allows the measurement of EQE, IPCE, IQE and RS, accurately and quickly. This allows studying different device architectures, their losses, band gaps, among others. The system...

The vacuum oven is used to dry and activate samples under vacuum or under nitrogen atmosphere. It is used for applications requiring heating and vacuum conditions. It has an inner volume approx.. 25 L, it can operate with temperatures above 200ºC, the possible vacuum is up to 0.01 mbar. The oven...

Formlab Form 3+ printer with LFS (Low Force Stereolithography) technology with a printing volume of 144.78 x 144.78 x 185.42 mm. It can print pieces with a resolution between 25 -300µm on the Z axis and 25µm on the XY axis in thirty different materials.

Nutsche filtration is a batch filtration technique that operates within a sealed vessel utilizing vacuum or pressure. This process involves passing liquid through a filter plate equipped with a suitable filter media, facilitating immediate discharge of solids.

Dewar Transmission/Reflection Accessory is useful for examining solid samples at temperatures ranging from -175°C to 350°C in a controlled environment. A dewar is incorporated into this accessory for low temperature operation. For high temperature operation, low voltage heaters are used...

This vacuum chamber allows us to sublime materials in high vacuum (10^-6 mbar), which are deposited homogeneously as films into...

Sentech ICP-RIE 500-302 etching tool. Equipped with a vacuum load-lock for samples up to 100 mm diameter. The available gases for processing are: H2, Ar, O2, SF6, and C4F8

ElectraSyn 2.0 is a three-in-one device that runs electrosynthesis, cyclic voltammetry (CV), and room temperature stirring. to run a simple CV and explore the substrate’s electrochemical properties; set up constant current or constant voltage reactions in the most intuitive way.