Pulsed Laser deposition (PLD) utilizes a high-power pulsed laser to vaporize a target material. This technique, crucial in microelectronics and nanotechnology, enables the growth of high-quality films with exceptional precision and uniformity and allows the deposition of hard metal oxides on top of thin soft organic layers without damaging or infiltrating the underneath coating. In the realm of optoelectronics, PLD plays a vital role in depositing charge transport layers and transparent conducting oxides. The chamber is integrated with a nitrogen glove box for samples transfer in inert atmosphere.